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3D Resist Profiling / Greyscale E-Beam Lithography for Nano-optics

Industry Clients

Utilizing partial exposure, which requires exacting process control, and enabled by the 3D-Proximity Effect Correction software capability of our GenISys LayoutBeamer software, we can create stepped or sloped resist profiles in a single e-beam exposure step. These profiles can be used to create a wide range of optics and nanophotonics effects.