Site Index



A B C D E F G H I J K L M N O P Q R S T U V W X Y Z



A


ACHK, Array Check, for viewing jobfile layout
AE Mark
Alignment Marks
Aperture Table (Aperture Positions)
Array Check, Viewing Job File Layouts
Arrays, in Job Files
Astigmatism, Adjustment with SFOCUS.
AutoCAD, why to not use
Averaging Exposure Methods

B


Background Reading
BE Mark
Beam Diameter
Bias, in LayoutBEAMER
Bilayer Resist for liftoff
Bordering, in LayoutBEAMER

C


CAD

Calibration
Calculators
Checklist, for Job Files
Chemicals, Safety
CHIPAL
CIF, CAD File Format
Clock, Calculator
Coarse/Fine Pattern Split, in LayoutBEAMER
Compiling a job file set (SCHD)
Condition Files
Contact Us
Coordinate Modes, Diagram
Copolymer PMMA Resist
CTXT Pattern Data Format
CURRNT, Measuring Beam Current

D


Datatype
Design Framework
Desktops (Workspaces) in the user interface
Diameter, Beam
Die Per Wafer Calculator
Directories
DISTBE, Field Distortion Correction
Dose

DXF, CAD File Format


E


EBEAM, computer which hosts LayoutBEAMER
EBSEND (transfer file from ebeam to jbx6300)
EOSSET, choosing condition file
Evaportion, for liftoff
Example Job Files
EXPOSE Program
Exposure Grid

F


FDA - Feature Dose Assignment
Field

Field Shift Writing
Files

Filter, in LayoutBEAMER
Floating Fields, in LayoutBEAMER
Fracturing

G


GenISys LayoutBEAMER)
Grid

H


Healing, Pattern Data, in LayoutBEAMER
Height Mapping
Highlights, Projects
History, Website Revisions
Holders, Sample
HSQ Resist

I


INITAE
INITBE

J


J01 Pattern Format Spec
JBXFiler - View J52 (.v30) Pattern Files
JDF Files - Job Deck File
JDI Files - Job Dose Include
Job Files

K


KLAYOUT, CAD Program


L


Layer
LayoutBEAMER (GenISys)
LayoutEditor, CAD Program

Layout Framework
Liftoff, angle diagram
Loading Holders
LTXT (text pattern format)

M


Machine Grid
ma-N Resist
Manual Field Placement, in LayoutBEAMER
MARKS (Mark Parameter Save and Restore Utility)
Marks, Alignment
Material Safety Data Sheets
Minimum Dose, Calculator
MODMOD, modify a MODULAT table.
MODULAT command
Moving the stage
MSDS

N


News

O


Operating, Basics
Overlap Writing

P


PATH
Pattern Files

PDEFBE - Calibrating the PDEF deflection
Photos, System
Piece Holders
PMMA Resist
PMMA Copolymer Resist
Process Map
Project Highlights
Proximity Effect Correction (PEC)

R


References, Books and Websites
Remote EBeam Services
Resist Data
Revision, Website Update History
Rules, Safety
Runtime Estimator (Calculator)

S


Safety
Scan Parameters for Alignment Marks
SCHD, job deck compiler
SDF (Schedule) Files
SEM Mode
SEM Inspection Sites (In Remote Jobs)
SETWFR
SFOCUS
Shape Fracturing
Shot Pitch, Definition
Silicon Photonics Layout Framework
Sleeving, in LayoutBEAMER
Staff, Contact Information
Stage, moving the stage
Stage Coordinates
Stigmation, beam adjustment with SFOCUS.
Stitching, Field
SUBDEFBE - calibration of subfield gain and rotation
Substrate Coordinates

T


Time, Runtime Estimator (Calculator)
Training
Transfer files from ebeam to jbx6300: EBSEND
TXL Pattern Format Reference

U

Unloading Holders
Updates, EBeam Website History
Uploading Pattern Data Files

VVideo Level Setting, for Alignment Marks


Videos, GenISys Training
Virtual Chip Marks

W


Workspaces (Desktops) in the user interface

X



Y



Z


ZEP-520A Resist


A B C D E F G H I J K L M N O P Q R S T U V W X Y Z