• EBeam Home
• News
  • Project Highlights
    • Graphene Devices
    • Biomechanics
    • Nanowires
    • Diamond Photonics
    • Nanoelectronics
    • Nanomagnetics
    • Zone Plates
    • Silicon Photonics
    • Photonic Crystals
    • Mid-IR Photonics
    • Photonics Prototyping
    • Greyscale EBL
    • Gratings
  • Publications
  • System Photos
  • Promotional Materials
• Remote Work
• Training
• Documentation
• Process
• Reference
• Site Index
• Site Map
• Website Updates

3D Resist Profiling / Greyscale E-Beam Lithography for Nano-optics

Industry Clients

Utilizing partial exposure, which requires exacting process control, and enabled by the 3D-Proximity Effect Correction software capability of our GenISys LayoutBeamer software, we can create stepped or sloped resist profiles in a single e-beam exposure step. These profiles can be used to create a wide range of optics and nanophotonics effects.